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SH 150-2W25-S, substrate manipulator on DN150 CF (O.D. 8")
mounting flange; for a 2 inch wafer, with tungsten heater and
25 mm linear travel for substrate transfer; with integrated main shutter

• Tungsten, tantalum or graphite heater
• Wafer temperatures up to 1200 °C
• Continuous substrate rotation and
  linear travel for substrate transfer
• Water cooled ceramic bearings for continuous rotation
• Clean operation and high reliability
• Substrate sizes up to 6 inch
• Optional: integrated main shutter

MBE-Komponenten offers a large variety of heatable Substrate Manipulators  SH.

Tungsten and tantalum wire heaters or graphite heaters are available. Through careful material selection and optimized design, clean operation and high reliability of our substrate manipulators are achieved.

SH manipulators are designed for continuous sample rotation. Inner water-cooled ceramic bearings allow long-time rotation.

U-shaped wafer holder of a SH 150-4W25

The wafer holding system of the SH manipulators is adapted to the transfer system of your system. Some examples are illustrated in the figures provided on the right:
A special U-shaped wafer holder for a substrate manipulator type SH 150-4W25 and a wafer holder made of tantalum for a Si wafer ring adapter. Solutions for standard Riber molybdenum wafer holders are available, too.

For standard face-down transfer systems a vertical linear substrate travel of 25 mm is provided. Increased linear travel is available on request.

Several manipulator options like integrated main shutter or electrically insulated wafer holding are provided.

Graphite heater of SH 200-4G25-SBT
and Ta substrate holder for a Si wafer ring adapter

A magnetically coupled rotary motion feedthrough (MRD 16) is used for substrate rotation and ensures a long and leak-free lifetime of the manipulator. Usual rotation speed during growth is in the range 10-30 RPM. For precise substrate rotation speed control we offer a manipulator control unit MCU. The MCU is delivered with a suitable electric motor and motor mounting kit.

Manipulator control unit MCU, with brushless motor, motor mount and magnetic rotary feedthrough on DN16 CF (O.D. 1.33") flange

Application

Our substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE.

W heaters are recommended for high-temperature applications.

For III-V MBE a Ta wire heater is recommended.

In SiGe MBE a pyrolytic graphite heater is often used. It provides clean UHV environment even at high operation temperature up to 1000°C.

Technical Data

Dimensions

For general information on CF mounting flanges see "Flange and Gasket Dimensions".

Specific Data

 LAST UPDATE: NOVEMBER, 2006

© 2003 Dr. Eberl MBE-Komponenten GmbH