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EBVV 63-4, vertical e-beam evaporator vertically mounted on
DN63 (O.D.4.5") CF-flange, crucible capacity 4 cm³ ;

• UHV compatible
• High purity evaporation
• Small dimensions; can be used in DN63CF(O.D.4.5'') effusion cell ports
• Hearth volumes 4cm³ or 5cm³
• Evaporation of metals and dielectrica
• Long filament lifetime
• Easy maintenance
• 270° beam deflection
• High frequency x-y-beam deflection system
• Silicon shielding parts for use in SiGe-MBE

MBE-Komponenten GmbH is pleased to offer you a new UHV electron beam evaporator for vertical mounting on a DN63CF (4,5" O.D.) flange: the EBVV63-4 and EBVV63-5.
The unique and extremely compact design permits to install the EBVV63 instead of an ordinary effusion cell on any MBE-system having DN63CF ports with an I.D. >=60mm. Despite its small footprint, the EBVV63 includes a complete electromagnetic x- and y- dynamic beam deflection system and can deliver beam powers up to 3kW @ 6kV.
Only UHV-grade materials are used without any compromise, especially for hot parts: molybdenum emitter block, tungsten filament and Al2O3 ceramics. The copper body is manufactured from OFHC (Oxygen-Free High-Conductivity)-copper. The copper hearth has a volume of 4 (5) cm³ (O.D. 22 (23) mm, taper 15° (12°) and 15mm depth) and is closely surrounded by a complete turn of a water channel for effective cooling.
The minimum length in vacuum is 234mm, while the evaporation plane (i.e. top of the pocket) is retracted by 14mm. Length can be increased up to 400mm We are pleased to assist you to integrate the EBVV63-4 (5) to your existing UHV-system. Don't hesitate to contact us for further information.

EBVV 63-4 Vertical electron beam evaporator

Application

EBVV 63-5, on DN63 (O.D.4.5") CF-flange
pool of molten silicon. EBV is mounted to a port 35° to vertical axis

The small dimensions and the vertical evaporator design open the path to a new range of applications:
In standard MBE-systems or in most home-made UHV chambers there are often no horizontal ports designated for typical e-beam evaporators. Here the compact design of the EBVV63-4 allows the integration of a powerful electron beam evaporator into virtually every UHV growth system. It can even be used in tilted ports without problems, depending on evaporant.
The EBVV63-4 (5) closes the gap between well known small rod-fed e-beam evaporators, usually only producing very low fluxes and only suitable for sublimating evaporants, and the common large horizontally mounted e-beam evaporators, which often are excessively space-consuming and far overrated for most MBE-applications. In some applications, the EBVV63-4 (5) may even be a good alternative for radiation-heated high-temperature sources.
The EBVV63-4 is the ideal evaporator for any low- or very low- vapor pressure material, including refractory metals or dopants like e.g. boron or carbon. It can also serve the upcoming demands in newly developed material systems, like high-k materials (Al₂O₃ or Pr₃O₃) or for other oxides / dielectrica.

Silicon shielding parts for SiGe-MBE

SiGe-MBE in standard MBE-systems is another key application for our EBVV63-4 (5). The use of the EBVV63-5 is recommended, because hearth capacity and geometry have been optimized for this special application. We provide a set of Si shielding parts and high purity single crystalline Si evaporant especially for theEBVV63-5 to achieve maximum cleanliness during Si epitaxy. Please ask for more information.

Set of silicon shielding parts for EBVV 63-5,

Dimensions

Technical Data

 LAST UPDATE: NOVEMBER, 2004

© 2003 Dr. Eberl MBE-Komponenten GmbH