Stichwort "wafer" in "Stichwort":
wafer in deposition stage
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Keywords
Keyword: wafer
wafer in manipulator
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wafer in sample transfer
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wafer in CuGaInSe2
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wafer in Power Supply and Temperature Control PS
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Stichwort "wafer" in "Online Editor":
wafer in OCTOPLUS 400 - Dr. Eberl MBE-Komponenten GmbH
OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
wafer in Substrate Manipulation - Dr. Eberl MBE-Komponenten GmbH
The product range includes substrate manipulators and heated stages for MBE chambers.
The product range includes substrate manipulators and heated stages for MBE chambers.
wafer in Substrate Manipulators SH - Dr. Eberl MBE-Komponenten GmbH
SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
wafer in Oxygen Resistant Substrate Manipulators SH-O - Dr. Eberl MBE-Komponenten GmbH
Using SiC or noble metal heaters, MBE-Komponenten offers substrate manipulators and heated stations that are resistant to oxygen or other corroding atmospheres.
Using SiC or noble metal heaters, MBE-Komponenten offers substrate manipulators and heated stations that are resistant to oxygen or other corroding atmospheres.
wafer in Wafer Heater WH - Dr. Eberl MBE-Komponenten GmbH
The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
wafer in OCTOPLUS 300 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
wafer in OCTOPLUS-O 400 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
wafer in OCTOPLUS 500 EBV - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
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