Stichwort "deposition" in "Stichwort":
deposition in deposition stage
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Keywords
Keyword: deposition
deposition in manipulator
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deposition in Power Supply and Temperature Control PS
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Stichwort "deposition" in "Online Editor":
deposition in OCTOPLUS 500 EBV - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
deposition in OCTOPLUS-O 400 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
deposition in OCTOPLUS 300 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
deposition in Publications - Dr. Eberl MBE-Komponenten GmbH
The following references are sorted by product and present a selection of publications based on the use of our MBE components and systems.
The following references are sorted by product and present a selection of publications based on the use of our MBE components and systems.
deposition in Customer References - Dr. Eberl MBE-Komponenten GmbH
The following list contains some of the most regular and well-established customers.
The following list contains some of the most regular and well-established customers.
deposition in Wafer Heater WH - Dr. Eberl MBE-Komponenten GmbH
The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
deposition in Oxygen Resistant Substrate Manipulators SH-O - Dr. Eberl MBE-Komponenten GmbH
Using SiC or noble metal heaters, MBE-Komponenten offers substrate manipulators and heated stations that are resistant to oxygen or other corroding atmospheres.
Using SiC or noble metal heaters, MBE-Komponenten offers substrate manipulators and heated stations that are resistant to oxygen or other corroding atmospheres.
deposition in Substrate Manipulators SH - Dr. Eberl MBE-Komponenten GmbH
SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
deposition in MBE-Components - Dr. Eberl MBE-Komponenten GmbH
Substrate manipulators, effusion cells, source clusters, doping cells, valved sources, e-beam evaporators, gas sources and proper equipment for R&D and industrial MBE applications.
Substrate manipulators, effusion cells, source clusters, doping cells, valved sources, e-beam evaporators, gas sources and proper equipment for R&D and industrial MBE applications.
deposition in OCTOPLUS 500 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 500 system was developed for the growth of high quality III-V and II/VI heterostructures on 4 inch or 6 inch Si substrates.
The OCTOPLUS 500 system was developed for the growth of high quality III-V and II/VI heterostructures on 4 inch or 6 inch Si substrates.
deposition in OCTOPLUS 400 - Dr. Eberl MBE-Komponenten GmbH
OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
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